film thickness to 34 nm is beneficial torelieve pattern collapse, a few bridging patterns still exist at athinner film[34 nm, Fig.5(B)].

30 nm line/spacepattern[Fig.5(A, B)]. An obvious pattern collapse and bridgingwere observed in the case of 47 nm thickness[F

ERincreased from 4.0 nm to 5.4 nm and the pattern profilesbecame poor when film thickness decreased from 47 nm[Fig.5(C)] to 34 nm

Bridgingpatterns are observed when the exposure dose is less than 70μC/cm 2

roomtemperature.

60 s

a 0.26 mol/L tetramethylammoniumhydroxide(TMAH)

Triphenylsulfoniumperfluoro-1-butanesufonate(

SCAP-1 res

TOA a

MEA at a